Near-infrared emission from mesoporous crystalline germanium | Zendy

Abderraouf Boucherif | Zendy; Andreas Korinek | Zendy; Vincent Aimez | Zendy; Richard Arès | Zendy

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Near-infrared emission from mesoporous crystalline germanium

Author(s) -

Abderraouf Boucherif,

Andreas Korinek,

Vincent Aimez,

Richard Arès

Publication year - 2014

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4898643

Subject(s) - germanium , crystallite , materials science , mesoporous material , photoluminescence , wafer , isotropic etching , etching (microfabrication) , band gap , nanostructure , quantum dot , optoelectronics , nanotechnology , analytical chemistry (journal) , silicon , chemistry , metallurgy , biochemistry , layer (electronics) , catalysis , chromatography

Mesoporous crystalline germanium was fabricated by bipolar electrochemical etching of Ge wafer in HF-based electrolyte. It yields uniform mesoporous germanium layers composed of high density of crystallites with an average size 5-7 nm. Subsequent extended chemical etching allows tuning of crystallites size while preserving the same chemical composition. This highly controllable nanostructure exhibits photoluminescence emission above the bulk Ge bandgap, in the near-infrared range (1095-1360nm) with strong evidence of quantum confinement within the crystallites

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