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Wet chemical thinning of molybdenum disulfide down to its monolayer
Author(s) -
Kiran Kumar Amara,
Leiqiang Chu,
Rajeev Kumar,
Minglin Toh,
Goki Eda
Publication year - 2014
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4893962
Subject(s) - molybdenum disulfide , materials science , monolayer , etching (microfabrication) , isotropic etching , layer (electronics) , substrate (aquarium) , crystal (programming language) , thin film , bilayer , molybdenum , chemical engineering , nanotechnology , composite material , metallurgy , chemistry , membrane , biochemistry , computer science , engineering , programming language , oceanography , geology
We report on the preparation of mono- and bi-layer molybdenum disulfide (MoS2) from a bulk crystal by facile wet chemical etching. We show that concentrated nitric acid (HNO3) effectively etches thin MoS2 crystals from their edges via formation of MoO3. Interestingly, etching of thin crystals on a substrate leaves behind unreacted mono- and bilayer sheets. The flakes obtained by chemical etching exhibit electronic quality comparable to that of mechanically exfoliated counterparts. Our findings indicate that the self-limiting chemical etching is a promising top-down route to preparing atomically thin crystals from bulk layer compounds

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