Open AccessGrowth and characterization of dilute nitride GaNxP1−x nanowires and GaNxP1−x/GaNyP1−y core/shell nanowires on Si (111) by gas source molecular beam epitaxy
Author(s) -
S. Sukritta,
Y. J. Kuang,
Alexandr Dobrovolsky,
Wonmo Kang,
Ja-Soon Jang,
BongJoong Kim,
Weimin Chen,
I. A. Buyanova,
C. W. Tu
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4893745
Subject(s) - nanowire , wurtzite crystal structure , molecular beam epitaxy , photoluminescence , materials science , transmission electron microscopy , vapor–liquid–solid method , epitaxy , band gap , optoelectronics , nanotechnology , crystallography , chemistry , hexagonal crystal system , layer (electronics)
We have demonstrated self-catalyzed GaN xP1−x and GaN xP1−x/GaNyP1−y core/shell nanowire growth by gas-source molecular beam epitaxy. The growth window for GaN xP1−x nanowires was observed to be comparable to that of GaP nanowires (∼585 °C to ∼615 °C). Transmission electron microscopy showed a mixture of cubic zincblende phase and hexagonal wurtzite phase along the [111] growth direction in GaN xP1−x nanowires. A temperature-dependent photoluminescence (PL) study performed on GaN xP1−x/GaNyP1−y core/shell nanowires exhibited an S-shape dependence of the PL peaks. This suggests that at low temperature, the emission stems from N-related localized states below the conduction band edge in the shell, while at high temperature, the emission stems from band-to-band transition in the shell as well as recombination in the GaN xP1−x core
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