Open AccessGa lithography in sputtered niobium for superconductive micro and nanowires
Author(s) -
Michael David Henry,
Steve Wolfley,
Todd Monson,
Rupert Lewis
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4893446
Subject(s) - materials science , niobium , lithography , dry etching , sputtering , focused ion beam , ion milling machine , etching (microfabrication) , tin , optoelectronics , nanowire , fabrication , nanolithography , plasma etching , nanotechnology , layer (electronics) , thin film , ion , metallurgy , chemistry , medicine , alternative medicine , organic chemistry , pathology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom