Negative refraction by a planar Ag/SiO2 multilayer at ultraviolet wavelength to the limit of silver
Author(s) -
JunWei Zhao,
Jian Gao,
Yang Deng,
H. Liu,
X. Wang
Publication year - 2014
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4873156
Subject(s) - wavelength , planar , negative refraction , optics , materials science , metamaterial , refraction , permittivity , limit (mathematics) , long wavelength limit , absorption (acoustics) , semiconductor , dielectric , optoelectronics , ultraviolet , physics , condensed matter physics , mathematics , mathematical analysis , computer graphics (images) , computer science
For planar structured hyperbolic metamaterial, the shortest wavelength achievable for negative refraction is often limited by dielectric layers, which are usually wide band gap semiconductors that absorb light strongly at wavelength shorter than their absorption edge. Here we proposed that using SiO2 may break such limitation based on effective medium theory. Through calculation and simulation we demonstrated broad angle negative refraction by a planar Ag/SiO2 layered structure at wavelength down to 326 nm. Its imaging and focusing abilities were also presented. The lower limit of wavelength here is defined by the property of silver, whose permittivity turns positive below 324 nm
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