Schottky contacts to In2O3
Author(s) -
Holger von Wenckstern,
Daniel Splith,
Florian Schmidt,
Marius Grundmann,
Oliver Bierwagen,
James S. Speck
Publication year - 2014
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4870536
Subject(s) - schottky diode , schottky barrier , materials science , ohmic contact , sputtering , metal–semiconductor junction , optoelectronics , semiconductor , indium , rectification , depletion region , layer (electronics) , diode , thin film , nanotechnology , voltage , electrical engineering , engineering
n-type binary compound semiconductors such as InN, InAs, or In2O3 are especial because the branch-point energy or charge neutrality level lies within the conduction band. Their tendency to form a surface electron accumulation layer prevents the formation of rectifying Schottky contacts. Utilizing a reactive sputtering process in an oxygen-containing atmosphere, we demonstrate Schottky barrier diodes on indium oxide thin films with rectifying properties being sufficient for space charge layer spectroscopy. Conventional non-reactive sputtering resulted in ohmic contacts. We compare the rectification of Pt, Pd, and Au Schottky contacts on In2O3 and discuss temperature-dependent current-voltage characteristics of Pt/In2O3 in detail. The results substantiate the picture of oxygen vacancies being the source of electrons accumulating at the surface, however, the position of the charge neutrality level and/or the prediction of Schottky barrier heights from it are questioned
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