Open AccessIn situ study of e-beam Al and Hf metal deposition on native oxide InP (100)
Author(s) -
Hong Dong,
Santosh KC,
Angelica Azcatl,
Wilfredo Cabrera,
Xiaoye Qin,
Barry Brennan,
D. M. Zhernokletov,
Kyeongjae Cho,
Robert M. Wallace
Publication year - 2013
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4833569
Subject(s) - x ray photoelectron spectroscopy , indium , oxide , annealing (glass) , metal , analytical chemistry (journal) , electron beam physical vapor deposition , evaporation , chemistry , thin film , materials science , inorganic chemistry , metallurgy , chemical engineering , nanotechnology , physics , chromatography , engineering , thermodynamics
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