Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics | Zendy

Н. И. Чхало | Zendy; Н. Н. Салащенко | Zendy

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Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics

Author(s) -

Н. И. Чхало,

Н. Н. Салащенко

Publication year - 2013

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4820354

Subject(s) - nanolithography , wavelength , materials science , optics , nanophotonics , optoelectronics , physics , fabrication , medicine , alternative medicine , pathology

A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative to 6.7 and 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, and La/B multilayers were compared for efficiency at their working wavelengths. It is shown that a transition to 10.5 nm and 11.2 nm may be a solution to the problem of increasing performance and resolution of a projection system

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