Indium diffusion through high-k dielectrics in high-k/InP stacks
Author(s) -
Hong Dong,
Wilfredo Cabrera,
Rohit Galatage,
Santosh KC,
Barry Brennan,
Xiaoye Qin,
Stephen McDonnell,
D. M. Zhernokletov,
Christopher L. Hinkle,
Kyeongjae Cho,
Yves J. Chabal,
Robert M. Wallace
Publication year - 2013
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4817932
Subject(s) - indium , x ray photoelectron spectroscopy , diffusion , materials science , dielectric , atomic layer deposition , analytical chemistry (journal) , spectroscopy , scattering , low energy ion scattering , layer (electronics) , chemistry , optoelectronics , nanotechnology , nuclear magnetic resonance , optics , physics , chromatography , quantum mechanics , thermodynamics
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