
Influence of film thickness and air exposure on the transport gap of manganese phthalocyanine
Author(s) -
Francisc Haidu,
Axel Fechner,
Georgeta Salvan,
Ovidiu D. Gordan,
Michael Fronk,
Daniel Lehmann,
Benjamin Mahns,
M. Knupfer,
Dietrich R. T. Zahn
Publication year - 2013
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4812230
Subject(s) - x ray photoelectron spectroscopy , manganese , band gap , phthalocyanine , fermi level , materials science , ellipsometry , ultraviolet photoelectron spectroscopy , analytical chemistry (journal) , spectroscopy , thin film , ultraviolet , optoelectronics , chemistry , nanotechnology , nuclear magnetic resonance , physics , metallurgy , quantum mechanics , chromatography , electron
The interface formation between manganese phthalocyanine (MnPc) and cobalt was investigated combining ultraviolet photoelectron spectroscopy and inverse photoelectron spectroscopy. The transport band gap of the MnPc increases with the film thickness up to a value of (1.2 ± 0.3) eV while the optical band gap as determined from spectroscopic ellipsometry amounts to 0.5 eV. The gap values are smaller compared to other phthalocyanines due to metallic Mn 3d states close to the Fermi level. The transport band gap was found to open upon air exposure as a result of the disappearance of the occupied 3d electronic states