Open AccessEvolution of nanoscale roughness in Cu/SiO2 and Cu/Ta interfaces
Author(s) -
Andrew P. Warren,
Tik Sun,
Bo Yao,
Katayun Barmak,
Michael F. Toney,
Kevin R. Coffey
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3675611
Subject(s) - surface finish , materials science , annealing (glass) , x ray reflectivity , specular reflection , surface roughness , thin film , scattering , analytical chemistry (journal) , optics , composite material , nanotechnology , chemistry , physics , chromatography
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