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Analysis and optimization approach for the doped amorphous layers of silicon heterojunction solar cells
Author(s) -
D. Pysch,
Christoph Meinhard,
NilsPeter Harder,
Martin Hermle,
Stefan W. Glunz
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3650255
Subject(s) - doping , materials science , heterojunction , passivation , amorphous silicon , common emitter , optoelectronics , silicon , open circuit voltage , saturation current , amorphous solid , solar cell , voltage , crystalline silicon , nanotechnology , layer (electronics) , chemistry , electrical engineering , engineering , organic chemistry
Comparison of the open-circuit voltage (external voltage V(oc,ext)) determined by Suns-V(oc) measurements with the implied voltage V(oc, impl) determined by transient photoconductance decay lifetime measurements can yield a quick and easy analysis of silicon heterojunction (SHJ) solar cells, especially in regard to finding the optimum doping concentration of the emitter layer [or back surface field (BSF)]. A sufficiently high doping concentration of the emitter and BSF is mandatory to extract the internal Fermi-level splitting and thus the internal voltage, at the solar cell contacts. However increasing the concentration of doping gases during the deposition of doped amorphous silicon layers results in a reduction of the interface passivation quality and Voc, impl. The best trade off is realized when the ratio of V(oc,ext) to V(oc,impl) (external/internal V(oc)-ratio zeta) reaches a saturation value near 1 upon increasing the doping concentration. AFORS-HET (Automat FOR Simulation of HETerostructures) simulations resulted in the conclusion that the characteristics of the external/internal Voc-ratio are mainly determined by the active doping concentration (doping minus defect concentration)

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