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Visible light emission from thin films containing Si, O, N, and H
Author(s) -
Brian H. Augustine,
E. A. Irene,
Ying Juan He,
Kent J. Price,
L. E. McNeil,
K. N. Christensen,
D. M. Maher
Publication year - 1995
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.359925
Subject(s) - suboxide , photoluminescence , materials science , silicon , thin film , chemical vapor deposition , x ray photoelectron spectroscopy , analytical chemistry (journal) , silicon oxynitride , nanocrystalline silicon , annealing (glass) , amorphous solid , amorphous silicon , optoelectronics , crystalline silicon , silicon nitride , nanotechnology , chemistry , crystallography , chemical engineering , chromatography , composite material , engineering

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