Calculation of the transport matrix for the coupled diffusion of dopants and vacancies
Author(s) -
S. List,
P. Pichler,
H. Ryssel
Publication year - 1994
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.357131
Subject(s) - dopant , vacancy defect , diffusion , jump , materials science , crystallographic defect , chemical physics , range (aeronautics) , condensed matter physics , coulomb , doping , molecular physics , chemistry , thermodynamics , physics , optoelectronics , quantum mechanics , composite material , electron
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