Open AccessThermal donor formation and annihilation in oxygen-implanted float-zone silicon
Author(s) -
S. Hahn,
H. J. Stein,
Steven C. Shatas,
F. A. Ponce
Publication year - 1992
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.351646
Subject(s) - oxygen , silicon , annealing (glass) , analytical chemistry (journal) , materials science , carbon fibers , spreading resistance profiling , transmission electron microscopy , thermal treatment , limiting oxygen concentration , ion implantation , chemistry , nanotechnology , ion , optoelectronics , metallurgy , composite material , organic chemistry , chromatography , composite number
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