Open AccessEnergy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar∕O2 mixtures
Author(s) -
Jon M. Andersson,
Erik Wallin,
E. P. Münger,
Ulf Helmersson
Publication year - 2006
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.2219163
Subject(s) - ion , sputtering , atomic physics , analytical chemistry (journal) , sputter deposition , phase (matter) , oxygen , partial pressure , chemistry , cavity magnetron , mass spectrometry , scattering , substrate (aquarium) , argon , flux (metallurgy) , materials science , thin film , optics , physics , nanotechnology , oceanography , organic chemistry , chromatography , geology
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