Open AccessMolecular content of the deposition flux during reactive Ar∕O2 magnetron sputtering of Al
Author(s) -
Jon M. Andersson,
Erik Wallin,
E. P. Münger,
Ulf Helmersson
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2170404
Subject(s) - flux (metallurgy) , analytical chemistry (journal) , sputtering , deposition (geology) , sputter deposition , ion , chemistry , substrate (aquarium) , mass spectrometry , cavity magnetron , ionization , physical vapor deposition , ionic bonding , thin film , materials science , environmental chemistry , nanotechnology , chromatography , paleontology , sediment , biology , oceanography , organic chemistry , geology
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