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Structure of Sc2O3 films epitaxially grown on α-Al2O3 (0001)
Author(s) -
A. R. Kortan,
N. Kopylov,
J. Kwo,
M. Hong,
C. P. Chen,
J. P. Mannáerts,
S. H. Liou
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2163989
Subject(s) - epitaxy , materials science , bixbyite , substrate (aquarium) , sapphire , crystallography , diffraction , thin film , optoelectronics , oxide , optics , nanotechnology , chemistry , metallurgy , laser , layer (electronics) , oceanography , physics , geology
[[abstract]]The crystal structure of scandium oxide films epitaxially grown on alpha-Al2O3 (0001) under an ultrahigh-vacuum is studied by single-crystal x-ray diffraction. The Sc2O3 film grows in bixbyite phase on the basal (0001) surface of the sapphire substrate with its < 111 > axis aligned parallel to the substrate normal. In-plane orientation of the film, however, exhibits two distinct growth directions that are defined by the two possible surface orientations of the stepped alpha-Al2O3 substrate. The atomic structure of the high-quality epitaxial film is fully relaxed and the film has unusual thickness uniformity. (c) 2006 American Institute of Physics.[[fileno]]2010113010014[[department]]物理

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