Annealing of Cold-Worked Copper by Electron Irradiation
Author(s) -
C. J. Meechan
Publication year - 1957
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1722706
Subject(s) - irradiation , copper , electrical resistivity and conductivity , annealing (glass) , electron beam processing , materials science , atmospheric temperature range , activation energy , residual resistivity , electron , vacancy defect , annihilation , atomic physics , condensed matter physics , analytical chemistry (journal) , metallurgy , chemistry , crystallography , nuclear physics , thermodynamics , physics , quantum mechanics , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom