Open AccessEffect of argon additive in negative hydrogen ion sources
Author(s) -
M. Bacal,
M. Nishiura,
M. Sasao,
M. Hamabe,
M. Wada,
H. Yamaoka
Publication year - 2002
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.1430880
Subject(s) - argon , hydrogen , ion , atomic physics , materials science , excited state , chemistry , physics , organic chemistry
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