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Characterization of the native Cr2O3 oxide surface of CrO2
Author(s) -
Ruihua Cheng,
Bo Xu,
Camelia N. Borca,
Andrei Sokolov,
Chul–Su Yang,
Liang Yuan,
S. H. Liou,
Bernard Doudin,
P. A. Dowben
Publication year - 2001
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1416474
Subject(s) - oxide , x ray photoelectron spectroscopy , materials science , band gap , characterization (materials science) , layer (electronics) , surface (topology) , thin film , condensed matter physics , analytical chemistry (journal) , nanotechnology , chemistry , optoelectronics , nuclear magnetic resonance , metallurgy , physics , geometry , mathematics , chromatography
Using photoemission and inverse photoemission, we have been able to characterize the Cr2O3 oxide surface of CrO2 thin films. The Cr2O3 surface oxide exhibits a band gap of about 3 eV, although the bulk CrO2 is conducting. The thickness of this insulating Cr2O3 layer is twice the photoelectron escape depth which is about 2 nm thick. The effective Cr2O3 surface layer Debye temperature, describing motion normal to the surface, is about 370 K. From a comparison of CrO2 films grown by different techniques, with different Cr2O3 content, evidence is provided that the CrO2 may polarize the Cr2O3. © 2001 American Institute of Physics. [DOI: 10.1063/1.1416474

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