Parallel integration and characterization of nanoscaled epitaxial lattices by concurrent molecular layer epitaxy and diffractometry
Author(s) -
Tsuyoshi Ohnishi,
Daisuke Komiyama,
Takashi Koida,
Satoru Ohashi,
C. Stauter,
Hideomi Koinuma,
Akira Ohtomo,
Mikk Lippmaa,
Nobuyoshi Nakagawa,
M. Kawasaki,
Takashi Kikuchi,
Kazuhiko Omote
Publication year - 2001
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1385587
Subject(s) - heterojunction , materials science , epitaxy , diffractometer , characterization (materials science) , fabrication , electron diffraction , thin film , nanotechnology , layer (electronics) , reflection (computer programming) , crystal structure , lattice (music) , diffraction , optoelectronics , crystallography , optics , chemistry , computer science , physics , programming language , pathology , medicine , alternative medicine , acoustics
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