Open AccessMicrowave plasma source for the negative hydrogen ion production
Author(s) -
M. Mozjetchkov,
T. Takanashi,
Y. Oka,
K. Tsumori,
M. Osakabe,
O. Kaneko,
Y. Takeiri,
T. Kuroda
Publication year - 1998
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.1148604
Subject(s) - plasma , atomic physics , microwave , ion source , materials science , hydrogen , plasma cleaning , electron temperature , argon , plasma diagnostics , inductively coupled plasma , dense plasma focus , magnetic field , electromagnetic electron wave , torr , physics , nuclear physics , quantum mechanics , thermodynamics
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