Identification of cesium effects on enhancement of H− production in a volume negative ion source
Author(s) -
Osamu Fukumasa,
Tomoaki Tanebe,
Hiroshi Naitou
Publication year - 1994
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.1145009
Subject(s) - caesium , ion , atomic physics , hydrogen , plasma , hydrogen production , materials science , volume (thermodynamics) , particle (ecology) , production (economics) , steady state (chemistry) , charged particle , physics , thermodynamics , chemistry , nuclear physics , oceanography , macroeconomics , quantum mechanics , economics , geology
Effects of cesium vapor injection on H- production in a tandem source are studied theoretically and parametrically as a function of different surface processes. Model calculation is done by solving a set of particle balance equations in steady-state hydrogen discharge plasmas. By including H- surface production processes caused by H atoms or positive hydrogen ions, enhancement of H- production observed experimentally is reproduced in the model
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