Open AccessWaveguide integrated GaN distributed Bragg reflector cavity using low‐cost nanolithography
Author(s) -
Jia Simeng,
Boulbar Emmanuel D. Le,
Balram Krishna C.,
Pugh Jon R.,
Wang Tao,
Allsopp Duncan W.E.,
Shields Philip A.,
Cryan Martin J.
Publication year - 2019
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2019.0366
Subject(s) - distributed bragg reflector , nanolithography , materials science , reflector (photography) , optoelectronics , waveguide , optics , distributed bragg reflector laser , light source , fabrication , physics , wavelength , medicine , alternative medicine , pathology
This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low‐cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite‐difference time‐domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.