Open AccessInfluence of surface roughness on the adhesion hysteresis of nano thin film
Author(s) -
Lin Qijing,
Zhang Fuzheng,
Han Feng,
Zhao Man,
Jiang Zhuangde
Publication year - 2019
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2019.0364
Subject(s) - hysteresis , materials science , adhesion , surface roughness , thin film , surface finish , composite material , sputter deposition , atomic force microscopy , nanotechnology , sputtering , condensed matter physics , physics
The influence of surface roughness on adhesion hysteresis of Cu thin films with different thickness was studied. The Cu thin films were fabricated using dc magnetron sputtering technology and their surface adhesion forces were measured using force‐displacement curves of atomic force microscopy. The experiment results show that the unload curve exhibits obvious adhesion hysteresis and that the roughness and adhesion force have opposite change tendency. The theoretical analysis on the influence of thin film roughness to the adhesion hysteresis was carried out using the Johnson–Kendall–Roberts model. The results show that the load curve and unload curve constitute a closed curve and that the smoother the surface, the more obvious adhesion hysteresis, i.e. the rougher the surface, the less obvious adhesion hysteresis. The theoretical analysis results are in good agreement with the experimental results.