
Ultra‐low light reflection surface using metal‐coated high‐aspect‐ratio nanopillars
Author(s) -
Jung Ju Ho,
Han Eui Don,
Kim Byeong Hee,
Seo Young Ho,
Park Yong Min
Publication year - 2019
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2018.5239
Subject(s) - nanopillar , materials science , aluminium , aspect ratio (aeronautics) , sputtering , hydrothermal circulation , metal , nanostructure , nanolithography , wavelength , platinum , optoelectronics , nanotechnology , optics , fabrication , composite material , metallurgy , thin film , chemical engineering , chemistry , medicine , biochemistry , alternative medicine , physics , pathology , engineering , catalysis
The study investigated the anti‐reflective properties of metal‐coated nanopillar arrays with high‐aspect ratio. Aluminium oxyhydroxide nanopillar arrays were prepared by using aluminium anodic oxidation, hydrothermal synthesis, and platinum sputtering on their surface. The anti‐reflective properties were evaluated on four types of nanostructures such as nanolens and nanopillar arrays with aspect ratios of 1:0.5, 1:3, 1:9, and 1:14. The nanopillar arrays with an aspect ratio of 1:14 demonstrated extremely low reflectance <0.18% at 550 nm wavelength of all measured incident angles.