Open AccessHigh‐reflection optical thin films based on SiO 2 /TiO 2 nanoparticles multilayers by dip coating
Author(s) -
Yuehui Wang,
Xing Yang
Publication year - 2018
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2018.0045
Subject(s) - materials science , wafer , scanning electron microscope , coating , optics , nanoparticle , refractive index , thin film , anti reflective coating , fabrication , silicon , dip coating , stacking , reflection (computer programming) , optoelectronics , optical coating , nanotechnology , composite material , chemistry , physics , computer science , programming language , medicine , alternative medicine , organic chemistry , pathology
The alternately stacking layers of SiO 2 and TiO 2 nanoparticles with different refractive indices were fabricated to form the distributed Bragg reflectors on the silicon wafer by dip coating method. By appropriate design of the thickness of the quarter‐wave layers, the peak reflectance region can be tuned from the blue‐green to the infrared portion of the electromagnetic spectrum. The peak reflectance of 65% at 800 nm and at 1600 nm has been achieved using seven periods, respectively; meanwhile, compared with the simulation, 80% at 800 nm and 70% at 1620 nm for seven periods, respectively. The scanning electron microscopy and the atomic force microscope studies confirm the thickness uniformity achieved along the fabrication direction, and a good quality of surfaces and interfaces.