Open AccessProcessing of graphene into a cantilever beam structure using a focused ion beam
Author(s) -
Matsui Kazuma,
Takei Yusuke,
Inaba Akira,
Takahata Tomoyuki,
Matsumoto Kiyoshi,
Shimoyama Isao
Publication year - 2016
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2016.0198
Subject(s) - graphene , materials science , cantilever , focused ion beam , raman spectroscopy , ion beam , irradiation , optoelectronics , ion , graphene nanoribbons , nanotechnology , beam (structure) , optics , composite material , chemistry , physics , organic chemistry , nuclear physics
A graphene cantilever beam of arbitrary shape by patterning suspended graphene using a focused ion beam (FIB) is fabricated. Suspended graphene was formed by transferring graphene over a trench structure and patterned the suspended graphene into a cantilever beam structure. When the suspended graphene is patterned by an FIB, the high‐ion irradiation of FIB deforms the shape of the cantilever beam; in contrast, low‐ion irradiation cannot penetrate the suspended graphene. An evaluation of the ion irradiation dose of the FIB and the damages caused to the suspended graphene confirmed that in the case of few‐layer graphene with a maximum of three layers, optimum processing can be performed by an ion irradiation of 6 × 10 16 ions/cm 2 . Under this condition, a graphene cantilever beam with a width of 1.34 μm and a length of 2.13 μm could be fabricated. Furthermore, the Raman spectroscopy results indicate that the FIB process does not significantly change the properties of the graphene.