Open AccessDeep submicron parallel scanning probe lithography using two‐degree‐of‐freedom microelectromechanical systems actuators with integrated nanotips
Author(s) -
Mehdizadeh Emad,
Pourkamali Siavash
Publication year - 2014
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2014.0272
Subject(s) - microelectromechanical systems , actuator , lithography , materials science , nanotechnology , optoelectronics , engineering , electrical engineering
A new enabling technology for low‐cost high throughput parallel scanning probe nanolithography is presented. Monolithic integration of microelectromechanical systems (MEMS) actuators with two‐dimensional probe arrays as well as preliminary results in the simultaneous generation of multiple submicron patterns using such structures is reported. Two‐degree‐of‐freedom electrothermal MEMS positioning structures integrated with nanoscale probe‐tips are used to perform parallel scanning probe nanolithography circumventing the main deficiency of tip‐based nanolithography, that is, low throughput. Simultaneous generation of multiple patterns scratched into 800 nm thick photoresist and 200 nm thick gold layers has been successfully demonstrated. Scratch marks as narrow and as long as ∼50 and 27 µm, respectively, have been generated in the X and Y directions using two different microactuator structures carrying 10 and 64 nanotips.