Open AccessFabrication of silicon hierarchical nanopillar arrays based on nanosphere lithography
Author(s) -
Su Zongming,
Zhang XiaoSheng,
Hu Wei,
Liu Wen,
Han Mengdi,
Zhang Haixia
Publication year - 2014
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2014.0260
Subject(s) - nanopillar , nanosphere lithography , nanotechnology , fabrication , materials science , silicon , lithography , nanolithography , optoelectronics , nanostructure , medicine , alternative medicine , pathology
A fabrication process of silicon hierarchical nanopillar arrays (NPAs) based on the self‐assembled colloid particle monolayer is presented. Using colloid particles assembled by the evaporation‐induced method as masks, well‐ordered silicon NPAs were fabricated by assessing the deep reactive ion etching process. After the optimisation of the cycles of etching and passivation steps, double‐layer hierarchical NPAs were achieved simultaneously. Systematic analysis and experiments were conducted to investigate the transition from well‐ordered silicon NPAs to silicon hierarchical NPAs. An explanation of this transition is provided based on the collapsing phenomenon discovered in the experiments.