Open AccessPatterning of graphene microscale structures using electrohydrodynamic atomisation deposition of photoresist moulds
Author(s) -
Wang Dazhi,
Ma Qian,
Liang Junsheng,
Xue Fanghong,
Chen Li,
Wang Xiaodong,
Zhou Xufeng,
Liu Zhaoping
Publication year - 2014
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2013.0678
Subject(s) - electrohydrodynamics , graphene , photoresist , materials science , sheet resistance , microscale chemistry , photolithography , deposition (geology) , nanotechnology , substrate (aquarium) , composite material , layer (electronics) , electrode , chemistry , paleontology , mathematics education , mathematics , oceanography , sediment , geology , biology
In this reported work, a graphene suspension was atomised and deposited using the electrohydrodynamic atomisation technique, enabling the formation of a wide range of graphene thin films. The influences of the atomisation‐substrate distance on the characteristics of the graphene films and their sheet resistances were analysed. A distance of 3 mm was found to be the optimum deposition distance for this graphene suspension to produce an even film and a low sheet resistance. At a lower and a higher working distance the graphene films exhibited a sharp‐angled heave surface behaviour and a high sheet resistance. In addition, electrohydrodynamic atomisation combined with a photolithography polymeric micromoulding technique was used to form graphene structures. After removing the photoresist micromould, the graphene structures remained under well‐arranged characteristics. After two layers of electrohydrodynamic atomisation deposition at a working distance of 3 mm, the thickness of the film was ∼400 nm and exhibited a sheet resistance of 127.5 Ω sq −1 (ohms per square).