Open AccessSuspended magnetic polymer structures fabricated using dose‐controlled ultraviolet exposure
Author(s) -
Kuo JuiChang,
Li ChongShuo,
Cheng HsuehChien,
Yang YaoJoe
Publication year - 2013
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2013.0438
Subject(s) - photoresist , ultraviolet , polymer , materials science , magnetic field , magnetic nanoparticles , optoelectronics , nanoparticle , ultraviolet light , nanotechnology , optics , composite material , physics , layer (electronics) , quantum mechanics
Presented is a process for fabricating suspended magnetic polymer structures with SU‐8 photoresist dispersed Fe 3 O 4 nanoparticles. By controlling the exposure doses of ultraviolet (UV) is shown light, floating structures are patterned during the first UV exposure and then the anchor structures are patterned at the second exposure. It is shown that suspended magnetic polymer structures, such as doubly‐clamped beams, can be successfully fabricated and released using a single development process. In addition, the functionalities and characteristics of these magnetic doubly‐clamped beams are demonstrated and discussed. The resonant frequencies of these structures were measured under a sinusoidal magnetic field at an amplitude of 10.37 mT; the frequencies for structures 5 and 6 mm long were 5.21 and 4.18 kHz, respectively.