
Near‐field uniformity analysis and compensation for finite‐sized beam combiner with the asymmetric layout
Author(s) -
Hao Kaizi,
Li Zhuo,
Wang Xin,
Zhou Lang,
Wang Yiting
Publication year - 2020
Publication title -
iet microwaves, antennas and propagation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.555
H-Index - 69
eISSN - 1751-8733
pISSN - 1751-8725
DOI - 10.1049/iet-map.2019.1082
Subject(s) - aperture (computer memory) , ripple , beam (structure) , square (algebra) , optics , amplitude , compensation (psychology) , transverse plane , near and far field , enhanced data rates for gsm evolution , field (mathematics) , mathematics , materials science , physics , acoustics , geometry , engineering , electrical engineering , telecommunications , structural engineering , psychology , psychoanalysis , pure mathematics , voltage
In a hardware‐in‐the‐loop simulation system, the insertion of an asymmetric layout beam combiner will seriously affect the near‐field uniformity. In this study, the effects of the aperture shape, transverse distance and size of the beam combiner on the near‐field uniformity were analysed. The square beam combiner with a transverse distance of 0.51 m and a size of 1.05 m × 1.05 m was regarded as the optimal design, but it still cannot meet the test requirements. In order to obtain excellent near‐field uniformity, an asymmetric Uniform + Linear taper compensation method was proposed. The maximum values of the amplitude fluctuation ( E pv ) and phase ripple ( φ pv ) decreased dramatically from 2.62 dB and 16.79° to 0.78 dB and 7.42°, respectively. Asymmetric Uniform + Linear taper was achieved through serrating the edge of the beam combiner. When the number of serrations N was 22, E pv and φ pv were <0.83 dB and 7.50°, respectively, which indicated that the near‐field uniformity can be significantly improved by asymmetric Uniform + Linear taper.