Open AccessAutomated alignment in mask‐free photolithography enabled by micro‐LED arrays
Author(s) -
Stonehouse M.,
Blanchard A.,
Guilhabert B.,
Zhang Y.,
Gu E.,
Watson I. M.,
Herrnsdorf J.,
Dawson M. D.
Publication year - 2021
Publication title -
electronics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.375
H-Index - 146
eISSN - 1350-911X
pISSN - 0013-5194
DOI - 10.1049/ell2.12244
Subject(s) - photolithography , photoresist , lithography , pixel , computer science , light emitting diode , computer hardware , materials science , cmos , maskless lithography , optoelectronics , artificial intelligence , nanotechnology , electron beam lithography , resist , layer (electronics)
We present an automated control system for micro scale positioning, based on single pixel imaging and fluorescence. By projecting a chequerboard array of CMOS controllable μ‐LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo‐lithography system using the automated control capability and a second μ‐LED array to photo‐cure customisable structures in photoresist with alignment referenced to the fluorescent markers.