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High‐performance engineered gate transistor‐based compact digital circuits
Author(s) -
Kumar S.,
Loan S.A.,
Alamoud A.M.
Publication year - 2017
Publication title -
electronics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.375
H-Index - 146
eISSN - 1350-911X
pISSN - 0013-5194
DOI - 10.1049/el.2016.3899
Subject(s) - nand gate , cmos , electronic circuit , gate equivalent , electronic engineering , transistor , nand logic , digital electronics , logic gate , xor gate , computer science , mosfet , electrical engineering , engineering , gate oxide , voltage
A novel method for designing and realising compact digital circuits by engineering MOSFET gate electrode is proposed. The novelty is the use of gate engineered single devices in the pull‐up (PU) and pull‐down (PD) paths of a static CMOS gate instead of multiple transistors as used in conventional CMOS implementations of circuits. Herein, two input NAND, NOR, and exclusive‐OR (XOR) gates employing the proposed gate engineering concept are designed and simulated. Engineered gate N‐type MOS and P‐type MOS are used for PD and pull‐up circuits, respectively. Since only two devices are used for a complete circuit: one in PU network and other in PD network; therefore, area and power of the proposed circuits get reduced significantly in comparison with the conventional static CMOS circuits. Mixed mode simulations have shown that the proposed technique realises NAND, NOR and XOR operations perfectly and it can be extended to realise other combinational and sequential circuits easily.

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