901 nm Lithographic vertical‐cavity surface‐emitting laser with stable single‐lobed beam pattern | Zendy

Li M. | Zendy; Yang X. | Zendy; Zhang Y. | Zendy; Zhao G. | Zendy; Beadsworth J. | Zendy; Eifert L. | Zendy; Tucker F. | Zendy; Deppe D.G. | Zendy

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901 nm Lithographic vertical‐cavity surface‐emitting laser with stable single‐lobed beam pattern

Author(s) -

Li M.,

Yang X.,

Zhang Y.,

Zhao G.,

Beadsworth J.,

Eifert L.,

Tucker F.,

Deppe D.G.

Publication year - 2015

Publication title -

electronics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.375

H-Index - 146

ISSN - 1350-911X

DOI - 10.1049/el.2015.3003

Subject(s) - materials science , lithography , vertical cavity surface emitting laser , optics , optoelectronics , laser , electron beam lithography , beam (structure) , photolithography , energy conversion efficiency , semiconductor laser theory , near and far field , resist , semiconductor , physics , nanotechnology , layer (electronics)

Data are presented on 901 nm lithographic vertical‐cavity surface‐emitting lasers (VCSELs) demonstrating high efficiency for small VCSEL sizes, and stable beam patterns. Power conversion efficiency >40% is obtained for VCSELs ranging in size from 6 to 2 µm diameter. The 2 µm diameter VCSELs produce output powers in excess of 6.5 mW, and produce single‐lobed far‐field radiation patterns over the full range of operation.

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