Open AccessEdge illuminated SiGe heterojunction phototransistor for RoF applications
Author(s) -
Tegegne Z.G.,
Viana C.,
Polleux J.L.,
Grzeskowiak M.,
Richalot E.
Publication year - 2015
Publication title -
electronics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.375
H-Index - 146
eISSN - 1350-911X
pISSN - 0013-5194
DOI - 10.1049/el.2015.2448
Subject(s) - photodiode , responsivity , cutoff frequency , optoelectronics , materials science , enhanced data rates for gsm evolution , heterojunction , bicmos , optics , electrical engineering , photodetector , physics , engineering , transistor , telecommunications , voltage
The first edge illuminated SiGe phototransistor based on the available commercial SiGe/Si BiCMOS technology for a low‐cost detector or mixer in radio‐over‐fibre applications. Its technology and structure are described. Edge mapping of the phototransistor performances, so as to observe the fastest and the highest sensitive areas of the structure, is performed. The phototransistor exhibits a cutoff frequency of 890 MHz and low frequency responsivity of 0.45 A/W at 850 nm. This new SiGe/Si phototransistor structure provides a cutoff frequency double that of a top illuminated SiGe/Si phototransistor obtained using the same BiCMOS technology.