Open AccessLow‐loss and polarisation‐insensitive interlayer coupler on three‐dimensional SiO x ‐waveguide platform
Author(s) -
Hiraki T.,
Tsuchizawa T.,
Nishi H.,
Yamamoto T.,
Yamada K.
Publication year - 2015
Publication title -
electronics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.375
H-Index - 146
eISSN - 1350-911X
pISSN - 0013-5194
DOI - 10.1049/el.2014.3549
Subject(s) - fabrication , transverse plane , materials science , waveguide , power dividers and directional couplers , thermal , coupling loss , optics , coupling (piping) , transverse magnetic , optoelectronics , layer (electronics) , transverse mode , optical fiber , composite material , physics , engineering , medicine , laser , alternative medicine , structural engineering , pathology , meteorology
A low‐loss and polarisation‐insensitive vertical directional coupler that connects vertically stacked SiO x waveguides is reported. The fabrication process features the low‐temperature formation of an SiO x film to prevent thermal damage to the lower layer waveguides. Experimental results showed interlayer coupling losses of <0.1 dB in both transverse‐electric and transverse‐magnetic modes.