Open AccessSi wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography
Author(s) -
Okayama H.,
Shimura D.,
Onawa Y.,
Takahashi H.,
Seki M.,
Koshino K.,
Yokoyama N.,
Oshtsuka M.,
Tsuchizawa T.,
Nishi H.,
Yamada K.,
Yaegashi H.,
Horikawa T.,
Sasaki H.
Publication year - 2013
Publication title -
electronics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.375
H-Index - 146
eISSN - 1350-911X
pISSN - 0013-5194
DOI - 10.1049/el.2013.2979
Subject(s) - materials science , optics , grating , arrayed waveguide grating , stray light , immersion lithography , lithography , waveguide , crosstalk , optoelectronics , excimer , resist , physics , wavelength division multiplexing , fluorescence , wavelength , layer (electronics) , composite material
A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of −23 dB was obtained.