Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography | Zendy

Okayama H. | Zendy; Shimura D. | Zendy; Onawa Y. | Zendy; Takahashi H. | Zendy; Seki M. | Zendy; Koshino K. | Zendy; Yokoyama N. | Zendy; Oshtsuka M. | Zendy; Tsuchizawa T. | Zendy; Nishi H. | Zendy; Yamada K. | Zendy; Yaegashi H. | Zendy; Horikawa T. | Zendy; Sasaki H. | Zendy

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Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography

Author(s) -

Okayama H.,

Shimura D.,

Onawa Y.,

Takahashi H.,

Seki M.,

Koshino K.,

Yokoyama N.,

Oshtsuka M.,

Tsuchizawa T.,

Nishi H.,

Yamada K.,

Yaegashi H.,

Horikawa T.,

Sasaki H.

Publication year - 2013

Publication title -

electronics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.375

H-Index - 146

eISSN - 1350-911X

pISSN - 0013-5194

DOI - 10.1049/el.2013.2979

Subject(s) - materials science , optics , grating , arrayed waveguide grating , stray light , immersion lithography , lithography , waveguide , crosstalk , optoelectronics , excimer , resist , physics , wavelength division multiplexing , fluorescence , wavelength , layer (electronics) , composite material

A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of −23 dB was obtained.

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