Open AccessSi wire array waveguide grating with parallel star coupler configuration fabricated by ArF excimer immersion lithography
Author(s) -
Okayama H.,
Shimura D.,
Takahashi H.,
Seki M.,
Toyama M.,
Sano T.,
Koshino K.,
Yokoyama N.,
Ohtsuka M.,
Sugiyama A.,
Ishitsuka S.,
Tsuchizawa T.,
Nishi H.,
Yamada K.,
Yaegashi H.,
Horikawa T.,
Sasaki H.
Publication year - 2013
Publication title -
electronics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.375
H-Index - 146
ISSN - 1350-911X
DOI - 10.1049/el.2013.0206
Subject(s) - materials science , grating , optics , lithography , immersion lithography , wavelength , demultiplexer , waveguide , optoelectronics , excimer , resist , physics , multiplexing , layer (electronics) , telecommunications , nanotechnology , multiplexer , fluorescence , computer science
An Si wire array waveguide grating wavelength demultiplexer fabricated using immersion ArF lithography is reported. The tilt directions of the input and output star couplers are aligned in the same direction to avoid phase error generated at the curved waveguides. A 16 channel device with 200 GHz wavelength spacing was fabricated.