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Laser ablation of the cell wall and localized patch clamping of the plasma membrane in the filamentous fungus Aspergillus : characterization of an anion‐selective efflux channel
Author(s) -
ROBERTS STEPHEN K.,
DIXON GRAHAM K.,
DUNBAR STUART J.,
SANDERS DALE
Publication year - 1997
Publication title -
new phytologist
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.742
H-Index - 244
eISSN - 1469-8137
pISSN - 0028-646X
DOI - 10.1046/j.1469-8137.1997.00862.x
Subject(s) - membrane , cell wall , biophysics , ion channel , hypha , patch clamp , plasma , efflux , ion transporter , membrane potential , chemistry , biology , biochemistry , microbiology and biotechnology , physics , receptor , quantum mechanics
summary We have used a pulsed u.v. laser to ablate the cell wall of the filamentous fungus Aspergillus niger van Tiegh., and expose the plasma membrane at defined points along the hypha. Using the patch clamp technique, giga ohm seals (up to 20 GΩ) and recordings of plasma membrane ion channels were obtained. We describe, for the first time in fungi, a 43 pS plasma membrane anion efflux channel. Its potential role in cell signalling and pH homeostasis is discussed.