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Regulation of fluoride ion release from Na 2 SiF 6 contained in resin based on hydrophobic siloxane layer coating
Author(s) -
Nakabo S.,
Torii Y.,
Itota T.,
Yoshiyama M.,
Ishikawa K.,
Suzuki K.
Publication year - 2002
Publication title -
journal of oral rehabilitation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.991
H-Index - 93
eISSN - 1365-2842
pISSN - 0305-182X
DOI - 10.1046/j.1365-2842.2002.00907.x
Subject(s) - fluoride , contact angle , fourier transform infrared spectroscopy , layer (electronics) , chemistry , siloxane , distilled water , hydrogen fluoride , chemical engineering , coating , nuclear chemistry , materials science , polymer chemistry , inorganic chemistry , composite material , organic chemistry , polymer , chromatography , engineering
Regulation of fluoride release from restorative resin or sealant is beneficial to patients as it will prevent the occurrence of the secondary caries. In this study, we evaluated whether or not the formation of a hydrophobic polysiloxane layer on the surface of the fluoride compound could contribute to the regulation of fluoride release from resin. First, sodium hexafluorosilicate (Na 2 SiF 6 ) powder was treated with γ ‐methacryloxypropyltrimethoxysilane ( γ ‐MPTS) and analysed with scanning electronmicroscopy (SEM), Fourier‐transform infrared spectroscopy (FT‐IR) and electron spectroscopy for chemical analysis (ESCA). Analysis revealed that a hydrophobic polysiloxane layer was formed on the surface of Na 2 SiF 6 powder. Heat treatment commonly used during γ ‐MPTS treatment was not necessary for the polysiloxane layer formation on the surface of Na 2 SiF 6 powder. Then Na 2 SiF 6 powder treated with γ ‐MPTS was loaded in bis‐GMA/TEGDMA resin, immersed in distilled water and fluoride release was measured using a fluoride electrode. We found that the rate of fluoride release was significantly lower from the resin containing Na 2 SiF 6 powder treated with c‐MPTS. We concluded, therefore, that c‐MPTS treatment and the resulting hydrophobic polysiloxane layer formation are very effective for the regulation of fluoride release from resin.