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Atomic vacancy‐induced friction on the graphite surface: observation by lateral force microscopy
Author(s) -
Paredes J. I.,
MartínezAlonso A.,
Tascón J. M. D.
Publication year - 2003
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1046/j.1365-2818.2003.01188.x
Subject(s) - graphite , vacancy defect , atomic force microscopy , materials science , etching (microfabrication) , atom (system on chip) , plasma etching , nanotechnology , chemical physics , composite material , chemistry , crystallography , layer (electronics) , computer science , embedded system
Summary Lateral force microscopy has been employed to investigate the frictional behaviour of atomic vacancies on the graphite surface. Such a study was only made possible by the controlled expansion of originally single‐atom vacancies into multiatom vacancies, employing oxygen plasma etching for this purpose. Enhanced friction was observed on the vacancy regions compared with pristine areas of graphite, the origin of which is examined and discussed.