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Current‐sensing scanning near‐field optical microscopy using a metal probe for nanometre‐scale observation of electrochromic films
Author(s) -
Iwata F.,
Mikage K.,
Sakaguchi H.,
Kitao M.,
Sasaki A.
Publication year - 2003
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1046/j.1365-2818.2003.01127.x
Subject(s) - electrochromism , nanometre , materials science , optical microscope , near field scanning optical microscope , scanning probe microscopy , microscopy , optoelectronics , optics , scanning electrochemical microscopy , bright field microscopy , nanotechnology , scanning electron microscope , electrode , chemistry , electrochemistry , physics , composite material
Summary A novel technique for scanning near‐field optical microscopy capable of point‐contact current‐sensing was developed in order to investigate the nanometre‐scale optical and electrical properties of electrochromic materials. An apertureless bent‐metal probe was fabricated in order to detect optical and current signals at a local point on the electrochromic films. The near‐field optical properties could be observed using the local field enhancement effect generated at the edge of the metal probe under p ‐polarized laser illumination. With regard to electrical properties, current signal could be detected with the metal probe connected to a high‐sensitive current amplifier. Using the current‐sensing scanning near‐field optical microscopy, the surface topography, optical and current images of coloured WO 3 thin films were observed simultaneously. Furthermore, nanometre‐scale electrochromic modification of local bleaching could be performed using the current‐sensing scanning near‐field optical microscopy. The current‐sensing scanning near‐field optical microscopy has potential use in various fields of nanometre‐scale optoelectronics.