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Effect of electron beam parameters on simulated CBED patterns from edge‐on grain boundaries
Author(s) -
Bokel,
Tichelaar,
Schapink
Publication year - 2000
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1046/j.1365-2818.2000.00639.x
Subject(s) - symmetry (geometry) , grain boundary , optics , beam (structure) , spherical aberration , materials science , cathode ray , acceleration voltage , enhanced data rates for gsm evolution , electron diffraction , electron , diffraction , physics , geometry , mathematics , microstructure , telecommunications , quantum mechanics , computer science , metallurgy , lens (geology)
Convergent beam electron diffraction (CBED) at vertical grain boundaries (parallel to the electron beam) can be applied to determine the symmetry of bicrystals. It can also be used to investigate the structure of the boundary region itself when subnanometre probe sizes are employed. In this paper it is shown that (sub)nanometre‐probe CBED patterns are largely influenced by the electron‐beam geometry. In particular, simulations of coherent CBED patterns based on the multislice algorithm show that the CBED pattern of an edge‐on interface depends on the defocus distance between the probe position and the specimen midplane, the probe size and the beam‐convergence angle. The pattern symmetry may be lower than the theoretically predicted symmetry in case of large spherical aberration. This effect increases with smaller accelerating voltages. An increase in the beam‐convergence angle also increases the possibility of a non‐optimum symmetry due to spherical aberration of a coherent probe. Thus, for the determination of an interface structure using subnanometre (coherent) probes, the imaging conditions play an important role.