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Micrometallurgy: a technique for examining the structure of binary‐element thin films over a wide range of composition
Author(s) -
EGERTON R. F.,
BENNETT J. C.
Publication year - 1996
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1046/j.1365-2818.1996.850645.x
Subject(s) - solubility , binary number , materials science , substrate (aquarium) , thin film , diffraction , composition (language) , range (aeronautics) , alloy , analytical chemistry (journal) , crystallography , optics , nanotechnology , chemistry , composite material , chromatography , physics , linguistics , oceanography , arithmetic , mathematics , philosophy , geology
We describe a procedure for producing thin‐film TEM specimens containing a thickness and/or composition gradient, utilizing an out‐of‐contact mask at an appropriate distance from the substrate. Imaging and diffraction capabilities of the TEM are used to examine the local structure of the film; EELS or EDX analysis provides the local elemental composition. The procedure is illustrated by results obtained from two binary‐alloy systems: Se–Te (which displays a complete range of solid solubility) and Sn–Ge (where mutual solubility is very low).