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Voltage bias stress effects in metal halide perovskites are strongly dependent on morphology and ion migration pathways
Author(s) -
Laura Flannery,
Jonathan Ogle,
Daniel Powell,
Christopher J. Tassone,
Luisa WhittakerBrooks
Publication year - 2020
Publication title -
journal of materials chemistry a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.637
H-Index - 212
eISSN - 2050-7488
pISSN - 2050-7496
DOI - 10.1039/d0ta10371c
Subject(s) - halide , perovskite (structure) , morphology (biology) , metal , materials science , stress (linguistics) , biasing , voltage , ion , chemical physics , chemistry , crystallography , inorganic chemistry , metallurgy , geology , electrical engineering , engineering , paleontology , linguistics , philosophy , organic chemistry

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