Open AccessAlkali ratio control for lead-free piezoelectric thin films utilizing elemental diffusivities in RF plasma
Author(s) -
Hussein Nili,
Ahmad Esmaielzadeh Kandjani,
Johan du Plessis,
Vipul Bansal,
Kourosh Kalantarzadeh,
Sharath Sriram,
Madhu Bhaskaran
Publication year - 2013
Publication title -
crystengcomm
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.813
H-Index - 132
ISSN - 1466-8033
DOI - 10.1039/c3ce40508g
Subject(s) - thin film , materials science , sputter deposition , dopant , piezoelectricity , sputtering , alkali metal , plasma , annealing (glass) , substrate (aquarium) , deposition (geology) , optoelectronics , analytical chemistry (journal) , nanotechnology , chemistry , composite material , doping , physics , organic chemistry , quantum mechanics , geology , paleontology , oceanography , chromatography , sediment , biology
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