z-logo
open-access-imgOpen Access
Geochemical characteristics of West Molokai shield‐ and postshield‐stage lavas: Constraints on Hawaiian plume models
Author(s) -
Xu Guangping,
Frey Frederick A.,
Clague David A.,
Abouchami Wafa,
BlichertToft Janne,
Cousens Brian,
Weisler Marshall
Publication year - 2007
Publication title -
geochemistry, geophysics, geosystems
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.928
H-Index - 136
ISSN - 1525-2027
DOI - 10.1029/2006gc001554
Subject(s) - geology , plume , geochemistry , shield , volcano , rare earth element , rare earth , earth science , petrology , geography , meteorology
There are systematic geochemical differences between the <2 Myr Hawaiian shields forming the subparallel spatial trends, known as Loa and Kea. These spatial and temporal geochemical changes provide insight into the spatial distribution of geochemical heterogeneities within the source of Hawaiian lavas, and the processes that create the Hawaiian plume. Lavas forming the ∼1.9 Ma West Molokai volcano are important for evaluating alternative models proposed for the spatial distribution of geochemical heterogeneities because (1) the geochemical distinction between Loa and Kea trends may end at the Molokai Fracture Zone and (2) West Molokai is a Loa‐trend volcano that has exposures of shield and postshield lavas. This geochemical study (major and trace element abundances and isotopic ratios of Sr, Nd, Hf, and Pb) shows that the West Molokai shield includes lavas with Loa‐ and Kea‐like geochemical characteristics; a mixed Loa‐Kea source is required. In contrast, West Molokai postshield lavas are exclusively Kea‐like. This change in source geochemistry can be explained by the observed change in strike of the Pacific plate near Molokai Island so that as West Molokai volcano moved away from a mixed Loa‐Kea source it sampled only the Kea side of a bilaterally zoned plume.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here